This paper presents the RFMicroElectro-Mechanical Systems (RF-MEMS) fabrication process on GaAs substrate developed at Selex-SI GaAs foundry. The process is fully compatible with standard MMICs and allows to realize both capacitive and ohmic RF-MEMS switches. The manufacturing of switches with very simple geometry showed promising results thus enabled the design of new devices with a more complex structure. An electro-mechanical model of such switches was carried out by using Coventorware. At the end of the article RF measurements are shown.
RF-MEMS manufacturing process on GaAs substrate fully compatible with MMICs
FARINELLI, PAOLA;OCERA, ALESSANDRO;SORRENTINO, Roberto
2008
Abstract
This paper presents the RFMicroElectro-Mechanical Systems (RF-MEMS) fabrication process on GaAs substrate developed at Selex-SI GaAs foundry. The process is fully compatible with standard MMICs and allows to realize both capacitive and ohmic RF-MEMS switches. The manufacturing of switches with very simple geometry showed promising results thus enabled the design of new devices with a more complex structure. An electro-mechanical model of such switches was carried out by using Coventorware. At the end of the article RF measurements are shown.File in questo prodotto:
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