The preparation of electrically conductive acrylic resins containing reduced graphene oxide (rGO) by photopolymerization is presented. The synthesis consists of a single-step procedure starting from a homogeneous water dispersion of GO, which undergoes reduction induced by the UV radiation during the photopolymerization of an acrylic resin. The role played by the amount of radical photoinitiator added to the resin has been evaluated in relation to the in-situ reduction of GO, that was monitored by X-ray photoelectron spectroscopy. GO was dispersed in water by Ultraturrax mixing and the water dispersion was mixed to polyethyleneglycol diacrylate (PEGDA) in order to add an actual content of GO in the range from 1 to 4 % by weight with respect to the resin. The formulations were added with 4 %wt of PI, coated on glass slides or silicon wafers and UV-cured, under nitrogen, with a light intensity on the surface of the sample of 30 mW/cm2 for different time up to 10 minutes.
In-situ graphene oxide reduction during UV-photopolymerization of graphene oxide/acrylic resin mixtures
VALENTINI, LUCA;BITTOLO BON, SILVIA;
2012
Abstract
The preparation of electrically conductive acrylic resins containing reduced graphene oxide (rGO) by photopolymerization is presented. The synthesis consists of a single-step procedure starting from a homogeneous water dispersion of GO, which undergoes reduction induced by the UV radiation during the photopolymerization of an acrylic resin. The role played by the amount of radical photoinitiator added to the resin has been evaluated in relation to the in-situ reduction of GO, that was monitored by X-ray photoelectron spectroscopy. GO was dispersed in water by Ultraturrax mixing and the water dispersion was mixed to polyethyleneglycol diacrylate (PEGDA) in order to add an actual content of GO in the range from 1 to 4 % by weight with respect to the resin. The formulations were added with 4 %wt of PI, coated on glass slides or silicon wafers and UV-cured, under nitrogen, with a light intensity on the surface of the sample of 30 mW/cm2 for different time up to 10 minutes.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
