Nitrogen-doped amorphous hydrogenated hard carbon films were deposited by r.f. glow discharge from methane-nitrogen mixtures onto silicon substrates. The elastic properties of films obtained for different N-2 partial pressures were investigated by Brillouin light scattering, while Raman spectroscopy, X-ray photoelectron spectroscopy and X-ray reflectivity were exploited to study their structural and vibrational properties. Addition of a low percentage of nitrogen in the films induces marked modifications of the microscopic film structure, which induces a clear decrease of the elastic constants.

Effect of Nitrogen Addition on the Elastic and Structural Properties of Amorphous Carbon Nitride Thin Films

VALENTINI, LUCA;KENNY, Jose Maria;CARLOTTI, Giovanni;SOCINO, Giovanni
2001

Abstract

Nitrogen-doped amorphous hydrogenated hard carbon films were deposited by r.f. glow discharge from methane-nitrogen mixtures onto silicon substrates. The elastic properties of films obtained for different N-2 partial pressures were investigated by Brillouin light scattering, while Raman spectroscopy, X-ray photoelectron spectroscopy and X-ray reflectivity were exploited to study their structural and vibrational properties. Addition of a low percentage of nitrogen in the films induces marked modifications of the microscopic film structure, which induces a clear decrease of the elastic constants.
2001
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11391/157731
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