Effects of fluorine incorporation on the properties of amorphous carbon/p-type crystalline silicon heterojunction diodes

Heterojunction diodes fabricated by plasma enhanced chemical vapor deposition of hydrogenated amorphous carbon (a-C:H) and fluorine-doped amorphous carbons (a-C:H:F) on p-type silicon are analyzed in terms of their electronic and photovoltaic properties. Their structural and optical properties were identified by Raman spectroscopy, X-ray photoelectron spectroscopy, ellipsometry, and UV–VIS transmittance. The nature of the heterojunction is confirmed by the rectifying current–voltage characteristic of carbonaceous deposits/p-Si junction. The diodes show a behavior dependent on the amount of the fluorine content. The photovoltaic behavior of the junction is investigated as a function of both fluorine incorporation and thermal treatment of the a-C:H:F films after the deposition. Better photovoltaic effects were observed from annealed a-C:H:F heterojunction structures. The optical and structural characterization performed on films after the thermal treatment indicates that this behavior is most likely due to an extended graphitization.