This paper presents the RF-MicroElectro-mechanical Systems (RF-MEMS) fabrication process on GaAs substrate developed at Selex-SI GaAs foundry. The process is fully compatible with standard MMICs and allows to realize both capacitive and ohmic RFMEMS switches. The manufacturing of switches with very simple geometry showed promising results thus enabled the design of new devices with a more complex structure. An electro-mechanical model of such switches was carried out by using Coventorware. In the last paragraph RF measurements are shown.

RF Integrated MEMS: an enabling technology for Next Generation Integrated Systems

FARINELLI, PAOLA;OCERA, ALESSANDRO;SORRENTINO, Roberto
2007

Abstract

This paper presents the RF-MicroElectro-mechanical Systems (RF-MEMS) fabrication process on GaAs substrate developed at Selex-SI GaAs foundry. The process is fully compatible with standard MMICs and allows to realize both capacitive and ohmic RFMEMS switches. The manufacturing of switches with very simple geometry showed promising results thus enabled the design of new devices with a more complex structure. An electro-mechanical model of such switches was carried out by using Coventorware. In the last paragraph RF measurements are shown.
2007
9788861290884
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11391/171300
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? ND
social impact