This paper presents the RF-MicroElectro-mechanical Systems (RF-MEMS) fabrication process on GaAs substrate developed at Selex-SI GaAs foundry. The process is fully compatible with standard MMICs and allows to realize both capacitive and ohmic RFMEMS switches. The manufacturing of switches with very simple geometry showed promising results thus enabled the design of new devices with a more complex structure. An electro-mechanical model of such switches was carried out by using Coventorware. In the last paragraph RF measurements are shown.
RF Integrated MEMS: an enabling technology for Next Generation Integrated Systems
FARINELLI, PAOLA;OCERA, ALESSANDRO;SORRENTINO, Roberto
2007
Abstract
This paper presents the RF-MicroElectro-mechanical Systems (RF-MEMS) fabrication process on GaAs substrate developed at Selex-SI GaAs foundry. The process is fully compatible with standard MMICs and allows to realize both capacitive and ohmic RFMEMS switches. The manufacturing of switches with very simple geometry showed promising results thus enabled the design of new devices with a more complex structure. An electro-mechanical model of such switches was carried out by using Coventorware. In the last paragraph RF measurements are shown.File in questo prodotto:
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