In this work we have investigated the influence of sheet resistance modifications underneath the contact on the extraction of the contact resistivity. A generalized scaling theory has been applied to the modeling of the cross Kelvin resistor. It is shown that the errors associated with the contact sheet resistance modification could become appreciable in low-resistance metallizations of interest in VLSI.

The effect of sheet resistance modifications underneath the contact on the extraction of the contact resistivity: application to the cross Kelvin resistor

SCORZONI, Andrea;
1988

Abstract

In this work we have investigated the influence of sheet resistance modifications underneath the contact on the extraction of the contact resistivity. A generalized scaling theory has been applied to the modeling of the cross Kelvin resistor. It is shown that the errors associated with the contact sheet resistance modification could become appreciable in low-resistance metallizations of interest in VLSI.
1988
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11391/916207
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